• DocumentCode
    2684776
  • Title

    Investigation of repetitive high quality electron beam from a pseudospark

  • Author

    Jain ; Rhee

  • fYear
    1990
  • fDate
    21-23 May 1990
  • Firstpage
    162
  • Abstract
    Summary form only given. An experimental investigation of a pseudospark-produced electron beam is being performed. The pseudospark chamber consists of modular six gap brass and insulator disks stacked between a hollow cathode and an anode. The anode has a 3.2-mm on-axis hole for the beam extraction. External capacitances are added to the self-capacitance of the pseudospark chamber to determine the beam behavior with different stored energies. The pseudospark is operated in the 5-25-kV voltage and 30-70-mtorr pressure ranges. A breakdown curve similar to Paschen´s curve (for two parallel electrodes) was obtained for the pseudospark. The breakdown occurs in two phases. During the first phase, the discharge voltage drops slowly while the discharge and beam current are small. In the second main breakdown phase, the discharge voltage drops to almost zero and the discharge and beam current rise to large values. For Cext=980 pF, an electron beam with a current of 150 A and an average energy of 25 keV is produced. The RMS emittance of the beam measured at an axial distance of 9 cm from the anode is 65 mm-mrad. This corresponds to a beam brightness of 1.0×1011 A/(m2-rad2), which characterizes the pseudospark as a high brightness source
  • Keywords
    electron beams; sparks; 25 keV; 3.2 mm; 30 to 70 mtorr; 5 to 25 kV; Paschen´s curve; RMS emittance; axial distance; beam current; breakdown curve; discharge voltage; external capacitance; high brightness source; insulator disks; modular six gap brass disks; on-axis hole; parallel electrodes; pseudospark; repetitive high quality electron beam; self-capacitance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
  • Conference_Location
    Oakland, CA, USA
  • Type

    conf

  • DOI
    10.1109/PLASMA.1990.110716
  • Filename
    5725988