Title :
The application of advanced techniques for complex focused-ion-beam device modification
Author :
Abramo, M.T. ; Hahn, L.L.
Author_Institution :
IBM Microelectronics Division
Keywords :
Aluminum; CMOS technology; Circuits; Conductive films; Insulation; Milling machines; Semiconductor films; Silicon compounds; Sputtering; Surface topography;
Conference_Titel :
Reliability of Electron Devices, Failure Physics and Analysis, 1996. Proceedings of the 7th European Symposium on
Print_ISBN :
0-7803-3369-1
DOI :
10.1109/ESREF.1996.888213
