GaN diffractive microlenses for UV micro-optics system

Author

Hou, C.C. ; Li, M.H. ; Chen, C.C. ; Sheu, J.K. ; Chang, J.Y. ; Chi, G.C. ; Wu, Chuck ; Cheng, W.T. ; Yeh, J.H.

Author_Institution

Inst. of Opt. Sci., Nat. Central Univ., Chung-li, Taiwan

Volume

2

fYear

2003

fDate

15-19 Dec. 2003

Abstract

In this work, diffractive microlenses were fabricated in GaN-based material by using gravy-level mask and inductively coupled plasma etching technique. We also propose to insert the GaN/AlN anti-reflection thin films in the microlenses to enhance the ultraviolet/visible rejection ratio. Due to high transparency of GaN and AlN in UV, the microlenses can be potentially used in the UV micro-optics system such as solar-blind detection applications. In the design example of this work, the structure may enhance the ultraviolet/visible rejection to be 10².

Keywords

III-V semiconductors; aluminium compounds; antireflection coatings; diffractive optical elements; gallium compounds; masks; microlenses; optical fabrication; optical multilayers; sputter etching; ultraviolet spectra; visible spectra; wide band gap semiconductors; GaN; GaN diffractive microlenses; GaN-AlN; GaN/AlN anti-reflection thin films; UV micro-optics system; gravy-level mask; inductive coupled plasma etching; ultraviolet/visible rejection ratio; Etching; Gallium nitride; Lenses; Microoptics; Nonhomogeneous media; Optical diffraction; Optical films; Plasma applications; Substrates; Textile industry;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on

Print_ISBN

0-7803-7766-4

Type

conf

DOI

10.1109/CLEOPR.2003.1277255

Filename

1277255