DocumentCode :
2685056
Title :
A comparison of focused ion beam and electron beam induced deposition processes
Author :
Lipp, S. ; Frey, L. ; Lehrer, C. ; Demm, E. ; Pauthner, S. ; Ryssel, H.
Author_Institution :
Universitat Erlangen-Nurnberg
fYear :
1996
fDate :
1996
Firstpage :
1779
Lastpage :
1782
Keywords :
Atomic force microscopy; Conductive films; Current measurement; Electron beams; Insulation; Integrated circuit synthesis; Ion beams; Needles; Platinum; Prototypes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability of Electron Devices, Failure Physics and Analysis, 1996. Proceedings of the 7th European Symposium on
Print_ISBN :
0-7803-3369-1
Type :
conf
DOI :
10.1109/ESREF.1996.888214
Filename :
888214
Link To Document :
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