DocumentCode
2685056
Title
A comparison of focused ion beam and electron beam induced deposition processes
Author
Lipp, S. ; Frey, L. ; Lehrer, C. ; Demm, E. ; Pauthner, S. ; Ryssel, H.
Author_Institution
Universitat Erlangen-Nurnberg
fYear
1996
fDate
1996
Firstpage
1779
Lastpage
1782
Keywords
Atomic force microscopy; Conductive films; Current measurement; Electron beams; Insulation; Integrated circuit synthesis; Ion beams; Needles; Platinum; Prototypes;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability of Electron Devices, Failure Physics and Analysis, 1996. Proceedings of the 7th European Symposium on
Print_ISBN
0-7803-3369-1
Type
conf
DOI
10.1109/ESREF.1996.888214
Filename
888214
Link To Document