Title :
Reliability of a focused ion beam repair on digital CMOS circuits
Author :
Van Camp, R. ; Van Doorselaer, K. ; Clemminck, I.
Author_Institution :
Alcatel Telecom Antwerp
Keywords :
CMOS digital integrated circuits; CMOS technology; Circuit testing; Clocks; Degradation; Electromigration; Integrated circuit interconnections; Ion beams; Prototypes; System testing;
Conference_Titel :
Reliability of Electron Devices, Failure Physics and Analysis, 1996. Proceedings of the 7th European Symposium on
Print_ISBN :
0-7803-3369-1
DOI :
10.1109/ESREF.1996.888216