Title :
Yield estimation model for lithography hotspot distortions
Author :
GoÌmez, S. ; Moll, Francesc
Author_Institution :
Dept. of Electron. Eng., Univ. Politec. de Catalunya, Barcelona, Spain
Abstract :
A yield formulation model to estimate the amount of lithography distortion expected in a printed layout is proposed. The yield formulation relates the probability of non-failure of a lithography hotspot with the yield loss. The application of the yield model is demonstrated for three different layout configurations showing that unidimensional designs may improve manufacturing yield.
Keywords :
distortion; failure analysis; lithography; losses; probability; lithography hotspot distortion; manufacturing yield improvement; nonfailure analysis; printed layout; probability; unidimensional design; yield estimation model; yield loss;
Journal_Title :
Electronics Letters
DOI :
10.1049/el.2013.0469
