• DocumentCode
    268529
  • Title

    Yield estimation model for lithography hotspot distortions

  • Author

    Gómez, S. ; Moll, Francesc

  • Author_Institution
    Dept. of Electron. Eng., Univ. Politec. de Catalunya, Barcelona, Spain
  • Volume
    49
  • Issue
    17
  • fYear
    2013
  • fDate
    August 15 2013
  • Firstpage
    1066
  • Lastpage
    1068
  • Abstract
    A yield formulation model to estimate the amount of lithography distortion expected in a printed layout is proposed. The yield formulation relates the probability of non-failure of a lithography hotspot with the yield loss. The application of the yield model is demonstrated for three different layout configurations showing that unidimensional designs may improve manufacturing yield.
  • Keywords
    distortion; failure analysis; lithography; losses; probability; lithography hotspot distortion; manufacturing yield improvement; nonfailure analysis; printed layout; probability; unidimensional design; yield estimation model; yield loss;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el.2013.0469
  • Filename
    6583109
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=268529