DocumentCode :
2685411
Title :
Development of a high repetition rate pulse power source and its applications to soft X-ray generation
Author :
Arita, H. ; Suzuki, Kenji ; Kurosawa, Yoshiaki ; Hirasawa, K. ; Ochiai, I.
fYear :
1990
fDate :
21-23 May 1990
Firstpage :
176
Abstract :
Summary form only given. High-repetition-rate pulse power sources using disk-type ceramic capacitors mainly made of BaTiO3 have been developed. The pulse power source consists of a 30-kV, 8.7-μF, 3.9-kJ capacitor bank with a 4000-piece small ceramic capacitor, a multitriggered gas gap, and a high-charged supply with constant-current charge control. This source produces a pulse current of 350 kA and a high repetition rate of 10 Hz. As load examples using this source, soft X-ray emissions from high-current vacuum spark and plasma focus were investigated. In the case of vacuum discharge using a copper electrode, relationships between X-ray emission time and X-ray intensity were examined. X-ray emissions resulted at 300 ns from discharge at 230 kA and the emission intensity increased as the pinch time from the discharge became longer, i.e. 900 ns. A plasma-focus X-ray source was examined using neon as a working gas. The pinch time dependence on the filling gas pressure was investigated. The model explained well the observed dependence in the case of a negative inner electrode
Keywords :
X-ray production; capacitor storage; pulsed power technology; 230 kA; 3.9 kJ; 30 kV; 300 ns; 350 kA; 900 ns; BaTiO3; Cu electrode; Ne; X-ray emission time; capacitor bank; ceramic capacitor; constant-current charge control; disk-type ceramic capacitors; filling gas pressure; high repetition rate pulse power source; high-charged supply; high-current vacuum spark; multitriggered gas gap; pinch; plasma focus; pulse current; pulse power source; soft X-ray generation; time dependence; vacuum discharge; working gas;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location :
Oakland, CA, USA
Type :
conf
DOI :
10.1109/PLASMA.1990.110754
Filename :
5726024
Link To Document :
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