DocumentCode :
2685454
Title :
Surface micro-fabrication of UV transparent materials by laser-induced backside wet etching
Author :
Niino, H. ; Ding, X. ; Kurosaki, R. ; Narazaki, A. ; Sato, T. ; Kawaguchi, Y.
Author_Institution :
Nat. Inst. of Adv. Ind. Sci. & Technol., Japan
Volume :
2
fYear :
2003
fDate :
15-19 Dec. 2003
Abstract :
Laser-induced backside wet etching of silica glass and sapphire plates was performed by the excitation of a liquid with a ns-pulsed UV excimer laser. Well-defined micropatterns were fabricated without debris and microcrack around the etched area. To understand the etching mechanism, the formation and propagation of shockwave and bubble were monitored by time-resolved optical microscopy at the interface between the silica glass and the liquid during etching process. Transient high-pressure as well as high-temperature generated by UV laser irradiation plays a key role in the etching process.
Keywords :
bubbles; excimer lasers; excited states; high-speed optical techniques; interface phenomena; laser ablation; laser beam etching; optical glass; sapphire; shock waves; time resolved spectra; transparency; Al2O3; SiO2; UV laser irradiation; UV transparent materials; bubble; excitation; laser-induced backside wet etching; micropatterns; ns-pulsed UV excimer laser; sapphire plates; shockwave; silica glass; silica glass-liquid interface; surface microfabrication; time-resolved optical microscopy; Chemical lasers; Glass; Laser ablation; Laser theory; Optical materials; Optical surface waves; Pulsed laser deposition; Silicon compounds; Surface emitting lasers; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
Print_ISBN :
0-7803-7766-4
Type :
conf
DOI :
10.1109/CLEOPR.2003.1277280
Filename :
1277280
Link To Document :
بازگشت