DocumentCode :
2685669
Title :
Fabry-Perot type antireflective coatings for binary mask applications in ArF and F2 excimer laser lithographies
Author :
Chen, H.L. ; Liu, M.C. ; Hsieh, C.I. ; Ko, F.H.
Author_Institution :
Nat. Nano Device Lab., Hsinchu, Taiwan
Volume :
2
fYear :
2003
fDate :
15-19 Dec. 2003
Abstract :
We demonstrated an antireflective coating structure based on a Fabry-Perot structure for binary masks of ArF and F2 excimer laser lithographies. Reflectance of less than l% at both 193 and 157 nm can be achieved.
Keywords :
antireflection coatings; argon compounds; excimer lasers; fluorine; masks; optical multilayers; reflectivity; ultraviolet lithography; ultraviolet spectra; 157 nm; 193 nm; ArF; ArF excimer laser; F2; F2 excimer laser; Fabry-Perot structure; antireflective coatings; binary mask; excimer laser lithographies; reflectance; Chemical lasers; Coatings; Fabry-Perot; Laser theory; Lithography; Optical films; Reflectivity; Resists; Semiconductor lasers; Writing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
Print_ISBN :
0-7803-7766-4
Type :
conf
DOI :
10.1109/CLEOPR.2003.1277293
Filename :
1277293
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2685669
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