DocumentCode :
2690446
Title :
Microstructure and properties of copper thick-films over aluminium nitride substrates: optimization of a nitrogen based atmosphere
Author :
Mellul, S. ; Navarro, D. ; Massiot, P. ; Lucat, C. ; Charpentier, A.
Author_Institution :
L-Air Liquide, Jouy en Josas, France
fYear :
1990
fDate :
0-0 1990
Firstpage :
428
Lastpage :
439
Abstract :
In order to improve the characteristics of copper thick film over aluminium nitride substrates, the authors studied the effects of oxygen additions to the nitrogen atmosphere of the furnace, at the level of the burnout zone. Experiments were carried out on both as-received and preoxidized AlN substrates. Scanning-electron-microscope examination of the copper film´s microstructure and electron probe microanalysis were carried out on copper thick-film/AlN cross sections and correlated with properties such as adhesion and resistivity, allowing the establishment of ideal firing atmosphere conditions for the manufacture of copper thick films over AlN.<>
Keywords :
aluminium compounds; copper; substrates; thick films; AlN substrates; Cu-AlN; N/sub 2/-O/sub 2/ atmosphere; adhesion; burnout zone; electron probe microanalysis; ideal firing atmosphere conditions; microstructure; process optimisation; resistivity; Aluminum; Atmosphere; Copper; Electrons; Furnaces; Microstructure; Nitrogen; Probes; Substrates; Thick films;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1990, IEMT Conference., 8th IEEE/CHMT International
Conference_Location :
Baveno, Italy
Type :
conf
DOI :
10.1109/IEMT8.1990.171065
Filename :
171065
Link To Document :
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