• DocumentCode
    2690446
  • Title

    Microstructure and properties of copper thick-films over aluminium nitride substrates: optimization of a nitrogen based atmosphere

  • Author

    Mellul, S. ; Navarro, D. ; Massiot, P. ; Lucat, C. ; Charpentier, A.

  • Author_Institution
    L-Air Liquide, Jouy en Josas, France
  • fYear
    1990
  • fDate
    0-0 1990
  • Firstpage
    428
  • Lastpage
    439
  • Abstract
    In order to improve the characteristics of copper thick film over aluminium nitride substrates, the authors studied the effects of oxygen additions to the nitrogen atmosphere of the furnace, at the level of the burnout zone. Experiments were carried out on both as-received and preoxidized AlN substrates. Scanning-electron-microscope examination of the copper film´s microstructure and electron probe microanalysis were carried out on copper thick-film/AlN cross sections and correlated with properties such as adhesion and resistivity, allowing the establishment of ideal firing atmosphere conditions for the manufacture of copper thick films over AlN.<>
  • Keywords
    aluminium compounds; copper; substrates; thick films; AlN substrates; Cu-AlN; N/sub 2/-O/sub 2/ atmosphere; adhesion; burnout zone; electron probe microanalysis; ideal firing atmosphere conditions; microstructure; process optimisation; resistivity; Aluminum; Atmosphere; Copper; Electrons; Furnaces; Microstructure; Nitrogen; Probes; Substrates; Thick films;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Manufacturing Technology Symposium, 1990, IEMT Conference., 8th IEEE/CHMT International
  • Conference_Location
    Baveno, Italy
  • Type

    conf

  • DOI
    10.1109/IEMT8.1990.171065
  • Filename
    171065