DocumentCode
2690446
Title
Microstructure and properties of copper thick-films over aluminium nitride substrates: optimization of a nitrogen based atmosphere
Author
Mellul, S. ; Navarro, D. ; Massiot, P. ; Lucat, C. ; Charpentier, A.
Author_Institution
L-Air Liquide, Jouy en Josas, France
fYear
1990
fDate
0-0 1990
Firstpage
428
Lastpage
439
Abstract
In order to improve the characteristics of copper thick film over aluminium nitride substrates, the authors studied the effects of oxygen additions to the nitrogen atmosphere of the furnace, at the level of the burnout zone. Experiments were carried out on both as-received and preoxidized AlN substrates. Scanning-electron-microscope examination of the copper film´s microstructure and electron probe microanalysis were carried out on copper thick-film/AlN cross sections and correlated with properties such as adhesion and resistivity, allowing the establishment of ideal firing atmosphere conditions for the manufacture of copper thick films over AlN.<>
Keywords
aluminium compounds; copper; substrates; thick films; AlN substrates; Cu-AlN; N/sub 2/-O/sub 2/ atmosphere; adhesion; burnout zone; electron probe microanalysis; ideal firing atmosphere conditions; microstructure; process optimisation; resistivity; Aluminum; Atmosphere; Copper; Electrons; Furnaces; Microstructure; Nitrogen; Probes; Substrates; Thick films;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Manufacturing Technology Symposium, 1990, IEMT Conference., 8th IEEE/CHMT International
Conference_Location
Baveno, Italy
Type
conf
DOI
10.1109/IEMT8.1990.171065
Filename
171065
Link To Document