• DocumentCode
    2691198
  • Title

    On Carbon doping to improve GeTe-based Phase-Change Memory data retention at high temperature

  • Author

    Beneventi, G. Betti ; Gourvest, E. ; Fantini, A. ; Perniola, L. ; Sousa, V. ; Maitrejean, S. ; Bastien, J.C. ; Bastard, A. ; Fargeix, A. ; Hyot, B. ; Jahan, C. ; Nodin, J.F. ; Persico, A. ; Blachier, D. ; Toffoli, A. ; Loubriat, S. ; Roule, A. ; Lhostis,

  • Author_Institution
    MINATEC, CEA-LETI, Grenoble, France
  • fYear
    2010
  • fDate
    16-19 May 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    This paper investigates material and electrical properties of a new chalcogenide alloy for Phase-Change Memories (PCM): Carbon-doped GeTe (named GeTeC). First, several physico-chemical, optical and electrical analyses have been performed on full-sheet chalcogenide depositions in order to understand the intrinsic GeTeC phase-change behavior, and to characterize structure and composition of amorphous and crystalline states. Then, GeTeC with two different Carbon doping (4% and 10%) has been integrated in pillar-type analytical PCM cells. Physico-chemical and electrical data indicate that GeTeC is characterized by a much more stable amorphous phase compared to undoped GeTe. Thus, GeTeC offers a slower programming speed versus GeTe, but an improved data retention at high temperature. Finally, we argue that GeTeC alloy is a promising candidate for future developments of PCM technologies for embedded applications.
  • Keywords
    carbon; doping; germanium alloys; phase change memories; random-access storage; tellurium alloys; GeTe:C; carbon doping; electrical analyses; electrical property; full-sheet chalcogenide depositions; optical analyses; phase-change memory data retention; physico-chemical analyses; pillar-type analytical PCM cells; Amorphous materials; Crystalline materials; Crystallization; Doping; Optical materials; Organic materials; Performance analysis; Phase change materials; Phase change memory; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Memory Workshop (IMW), 2010 IEEE International
  • Conference_Location
    Seoul
  • Print_ISBN
    978-1-4244-6719-8
  • Electronic_ISBN
    978-1-4244-7668-8
  • Type

    conf

  • DOI
    10.1109/IMW.2010.5488328
  • Filename
    5488328