• DocumentCode
    2692061
  • Title

    The dual role of PZT in metal-PZT-Al2O3 structure for nonvolatile memory cell

  • Author

    Cui, Sharon ; Eun, Dongseog ; Marinkovic, Bozidar ; Peng, Cheng-Yi ; Pan, Xiao ; Sun, Xiao ; Köser, Hür ; Ma, T.P.

  • Author_Institution
    Yale Univ., New Haven, CT, USA
  • fYear
    2010
  • fDate
    16-19 May 2010
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We have shown that the metal-PZT-Al2O3 memory stack exhibits much larger than usual memory window, in the direction of charge-trapping effect (which is opposite to the polarization switching effect) which we attribute to the enhanced charge injection due to the large polarization field of the PZT. Other attractive properties such as excellent endurance characteristics and good retention make the metalPZT-Al2O3 memory stack a promising candidate for nonvolatile memory technology. Although the memory stack used in this study contains relatively thick PZT that necessitates high P/E voltages, our preliminary results have shown much lower P/E voltages for thinner PZT, and results for such scaled memory stacks will be reported at the conference.
  • Keywords
    polarisation; random-access storage; Al2O3; charge-trapping effect; endurance characteristics; enhanced charge injection; memory stack; metal-PZT-Al2O3 structure; nonvolatile memory cell; polarization field; polarization switching effect; Aluminum oxide; Annealing; Capacitance-voltage characteristics; Dielectric substrates; Ferroelectric materials; Grain boundaries; Mechanical factors; Nonvolatile memory; Polarization; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Memory Workshop (IMW), 2010 IEEE International
  • Conference_Location
    Seoul
  • Print_ISBN
    978-1-4244-6719-8
  • Electronic_ISBN
    978-1-4244-7668-8
  • Type

    conf

  • DOI
    10.1109/IMW.2010.5488383
  • Filename
    5488383