DocumentCode
2692061
Title
The dual role of PZT in metal-PZT-Al2 O3 structure for nonvolatile memory cell
Author
Cui, Sharon ; Eun, Dongseog ; Marinkovic, Bozidar ; Peng, Cheng-Yi ; Pan, Xiao ; Sun, Xiao ; Köser, Hür ; Ma, T.P.
Author_Institution
Yale Univ., New Haven, CT, USA
fYear
2010
fDate
16-19 May 2010
Firstpage
1
Lastpage
2
Abstract
We have shown that the metal-PZT-Al2O3 memory stack exhibits much larger than usual memory window, in the direction of charge-trapping effect (which is opposite to the polarization switching effect) which we attribute to the enhanced charge injection due to the large polarization field of the PZT. Other attractive properties such as excellent endurance characteristics and good retention make the metalPZT-Al2O3 memory stack a promising candidate for nonvolatile memory technology. Although the memory stack used in this study contains relatively thick PZT that necessitates high P/E voltages, our preliminary results have shown much lower P/E voltages for thinner PZT, and results for such scaled memory stacks will be reported at the conference.
Keywords
polarisation; random-access storage; Al2O3; charge-trapping effect; endurance characteristics; enhanced charge injection; memory stack; metal-PZT-Al2O3 structure; nonvolatile memory cell; polarization field; polarization switching effect; Aluminum oxide; Annealing; Capacitance-voltage characteristics; Dielectric substrates; Ferroelectric materials; Grain boundaries; Mechanical factors; Nonvolatile memory; Polarization; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Memory Workshop (IMW), 2010 IEEE International
Conference_Location
Seoul
Print_ISBN
978-1-4244-6719-8
Electronic_ISBN
978-1-4244-7668-8
Type
conf
DOI
10.1109/IMW.2010.5488383
Filename
5488383
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