• DocumentCode
    2692097
  • Title

    Polarization-induced zener tunnel junctions in wide-bandgap heterostructures

  • Author

    Simon, John ; Zhang, Ze ; Goodman, Kevin ; Kosel, Thomas ; Fay, Patrick ; Jena, Debdeep

  • Author_Institution
    Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN, USA
  • fYear
    2009
  • fDate
    22-24 June 2009
  • Firstpage
    101
  • Lastpage
    102
  • Abstract
    The wide bandgap semiconductors such as the lll-V nitrides (GaN, AIN) and SiC, tunneling is low due to the high barrier heights, and is hampered further by the inability to achieve degenerate n and p-type impurity doping. By utilizing the giant built-in electronic polarization fields present in wurzite lll-V nitride semiconductor heterostructures, it is possible to achieve interband tunneling in p-n junction diodes. GaN-AIN-GaN heterostructures were grown by plasma assisted Molecular Beam Epitaxy (MBE) on n-type doped GaN 0001 substrates. The layer structure, and a Transmission Electron Microscope (TEM) image of the GaN/AIN/GaN tunnel junction which was used to confirm the thickness and uniformity of the AIN layer. Current-voltage characteristics of the junctions were measured at 300 K in a probe station using a semiconductor parameter analyzer. By utilizing the polarization fields present in lll-V nitride semiconductors it is possible to generate band to band tunneling. This will enable multicolor light emitters/detectors and multijunction solar cells, as well as enable efficient injection of polarized carriers for spintronic devices.
  • Keywords
    III-V semiconductors; Zener effect; aluminium compounds; doping; gallium compounds; light emitting diodes; molecular beam epitaxial growth; p-n heterojunctions; silicon compounds; solar cells; transmission electron microscopy; tunnelling; wide band gap semiconductors; GaN; GaN-AlN-GaN; MBE; SiC; TEM; current-voltage characteristics; electronic polarization fields; multicolor light emitters-detectors; multijunction solar cells; p-n junction diodes; p-type impurity doping; plasma assisted molecular beam epitaxy; polarization-induced zener tunnel junctions; spintronic devices; temperature 300 K; transmission electron microscopy; tunneling; wide-bandgap semiconductor heterostructures; wurzite lll-V nitride semiconductor heterostructures; Gallium nitride; Molecular beam epitaxial growth; Optical polarization; P-n junctions; Plasma measurements; Semiconductor device doping; Semiconductor impurities; Silicon carbide; Tunneling; Wide band gap semiconductors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2009. DRC 2009
  • Conference_Location
    University Park, PA
  • Print_ISBN
    978-1-4244-3528-9
  • Electronic_ISBN
    978-1-4244-3527-2
  • Type

    conf

  • DOI
    10.1109/DRC.2009.5354860
  • Filename
    5354860