Title :
Atomistic deconstruction of clear performance advantages of a monolithically patterned wide-narrow-wide all-graphene FET
Author :
Unluer, D. ; Tseng, Fan-Shuo ; Ghosh, Avik W. ; Stan, M.R. ; Brown, C.L.
Author_Institution :
ECE Dept., Univ. of Virginia, Charlottesville, VA, USA
Abstract :
Summary form only given. Experiments show that wide GNRs are all metallic while ultra thin ribbons (<10 nm in width) are all semiconducting and the bandgap increases as the width get narrower. This leads us to design an all a graphene nanoribbon field effect transistor (GNRFET) and atomistically simulate its transport properties. We expect this system to benefit from the unique 2-D electrostatics of the source-drain regions and the covalent bonding at the contact-channel interfaces.
Keywords :
electrostatics; energy gap; field effect transistors; nanostructured materials; 2D electrostatics; GNR; atomistic deconstruction; bandgap; contact-channel interfaces; covalent bonding; graphene nanoribbon field effect transistor; monolithically patterned wide-narrow-wide all-graphene FET; source-drain regions; transport property; ultra thin ribbons; Dielectric substrates; Electrostatics; FETs; Geometry; High K dielectric materials; High-K gate dielectrics; Schottky barriers; Semiconductivity; Solid modeling; Voltage;
Conference_Titel :
Device Research Conference, 2009. DRC 2009
Conference_Location :
University Park, PA
Print_ISBN :
978-1-4244-3528-9
Electronic_ISBN :
978-1-4244-3527-2
DOI :
10.1109/DRC.2009.5354895