DocumentCode
2692986
Title
Amorphous carbon film preparation by shunting arc discharge in vacuum
Author
Yukimura, Ken ; Kumagai, Motoya ; Takaki, Koichi
Author_Institution
Doshisha Univ., Kyoto, Japan
Volume
1
fYear
2003
fDate
15-18 June 2003
Firstpage
567
Abstract
Diamond-like carbon film (DLC) was deposited by PBII&D method using a carbon shunting arc discharge in vacuum. The prepared film was in a state of amorphous and its surface is clean and smooth. A pulse or DC voltage of 0 to -15 kV is applied to the substrate with any filtering method to eliminate droplets. A future prospect of the various film preparations using the shunting arc discharge was also discussed.
Keywords
amorphous state; diamond-like carbon; films; plasma immersion ion implantation; substrates; vacuum arcs; vacuum breakdown; 0 to 15 kV; DC voltage; DLC; amorphous carbon film preparation; diamond-like carbon film; plasma-based ion implantation and deposition; pulse voltage; shunting arc discharge; substrate; Amorphous materials; Arc discharges; Capacitors; Diamond-like carbon; Optical films; Plasma materials processing; Plasma sources; Surface discharges; Vacuum arcs; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Pulsed Power Conference, 2003. Digest of Technical Papers. PPC-2003. 14th IEEE International
Conference_Location
Dallas, TX, USA
Print_ISBN
0-7803-7915-2
Type
conf
DOI
10.1109/PPC.2003.1277775
Filename
1277775
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