• DocumentCode
    2693165
  • Title

    SiC bipolar integrated circuits on semi-insulating substrates

  • Author

    Singh, S. ; Cooper, J.A.

  • Author_Institution
    Birck Nanotechnol. Center, Purdue Univ., West Lafayette, IN, USA
  • fYear
    2009
  • fDate
    22-24 June 2009
  • Firstpage
    273
  • Lastpage
    274
  • Abstract
    Because of its wide bandgap, silicon carbide is attractive for applications in harsh environments, especially high temperature applications. Thermal generation currents are negligible in SiC, even at high temperatures, and the intrinsic temperature of SiC is above 900¿C. As a result, the upper temperature of SiC devices is limited by the stability of the associated metallurgy or dielectrics, rather than by the semiconductor. One of the most severe limitations is imposed by the SiO2 gate insulator in MOS devices, which limits their maximum operating temperature to about 200 ¿C. For applications above 200 ¿C, bipolar devices are required. In this work we report the performance of second-generation bipolar integrated circuits in 4H-SiC. These circuits are suitable for smallscale integration applications in smart power, aerospace, automotive, and well logging applications.
  • Keywords
    bipolar integrated circuits; dielectric properties; metallurgy; silicon compounds; wide band gap semiconductors; SiC; associated metallurgy; bipolar integrated circuits; dielectrics; semi-insulating substrates; silicon carbide; stability; thermal generation currents; Automotive engineering; Bipolar integrated circuits; Dielectric devices; Dielectrics and electrical insulation; MOS devices; Photonic band gap; Silicon carbide; Substrates; Temperature; Thermal stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2009. DRC 2009
  • Conference_Location
    University Park, PA
  • Print_ISBN
    978-1-4244-3528-9
  • Electronic_ISBN
    978-1-4244-3527-2
  • Type

    conf

  • DOI
    10.1109/DRC.2009.5354928
  • Filename
    5354928