DocumentCode
2693165
Title
SiC bipolar integrated circuits on semi-insulating substrates
Author
Singh, S. ; Cooper, J.A.
Author_Institution
Birck Nanotechnol. Center, Purdue Univ., West Lafayette, IN, USA
fYear
2009
fDate
22-24 June 2009
Firstpage
273
Lastpage
274
Abstract
Because of its wide bandgap, silicon carbide is attractive for applications in harsh environments, especially high temperature applications. Thermal generation currents are negligible in SiC, even at high temperatures, and the intrinsic temperature of SiC is above 900¿C. As a result, the upper temperature of SiC devices is limited by the stability of the associated metallurgy or dielectrics, rather than by the semiconductor. One of the most severe limitations is imposed by the SiO2 gate insulator in MOS devices, which limits their maximum operating temperature to about 200 ¿C. For applications above 200 ¿C, bipolar devices are required. In this work we report the performance of second-generation bipolar integrated circuits in 4H-SiC. These circuits are suitable for smallscale integration applications in smart power, aerospace, automotive, and well logging applications.
Keywords
bipolar integrated circuits; dielectric properties; metallurgy; silicon compounds; wide band gap semiconductors; SiC; associated metallurgy; bipolar integrated circuits; dielectrics; semi-insulating substrates; silicon carbide; stability; thermal generation currents; Automotive engineering; Bipolar integrated circuits; Dielectric devices; Dielectrics and electrical insulation; MOS devices; Photonic band gap; Silicon carbide; Substrates; Temperature; Thermal stability;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference, 2009. DRC 2009
Conference_Location
University Park, PA
Print_ISBN
978-1-4244-3528-9
Electronic_ISBN
978-1-4244-3527-2
Type
conf
DOI
10.1109/DRC.2009.5354928
Filename
5354928
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