DocumentCode
2693504
Title
Double-port AlN/Sapphire high overtone bulk acoustic resonators for the stabilization of radio-frequency oscillators
Author
Chretien, N. ; Martin, G. ; Lebrasseur, Eric ; Wang, Huifang ; Baron, T. ; Ballandras, S. ; Henaff, E. ; Tomaso, F. ; Chommeloux, L.
Author_Institution
Time & Freq., FEMTO-ST, Besancon, France
fYear
2012
fDate
7-10 Oct. 2012
Firstpage
2210
Lastpage
2213
Abstract
The interest of double-port AlN/Sapphire high overtone bulk acoustic resonators for the stabilization of radiofrequency oscillators is investigated. Resonators are built by depositing AlN onto Sapphire to provide high quality factors, as required for stable oscillators. The resonators are based on laterally-coupled single resonators exchanging energy via a gap of few tens of μm separating them and adjusted to optimize the quality factor. Combining AlN with high acoustic quality materials finally has provided a quality factor of 53,000 at 1.8 GHz (Q.f product of about 9.5 × 1013) at room temperature. An oscillator stabilized with this resonator has been characterized, yielding a phase noise floor of -155 dBc/Hz and an Allan deviation of 10-9 for τ = 1 s.
Keywords
Q-factor; acoustic resonators; phase noise; radiofrequency oscillators; stability; Allan deviation; acoustic quality materials; double port AlN/sapphire high overtone bulk acoustic resonator; phase noise floor; quality factor; radiofrequency oscillators; stabilization; Acoustics; Electrodes; III-V semiconductor materials; Oscillators; Q-factor; Resonant frequency; High overtone Bulk Acoustic Resonator; high quality factors; oscillators; phase noise;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium (IUS), 2012 IEEE International
Conference_Location
Dresden
ISSN
1948-5719
Print_ISBN
978-1-4673-4561-3
Type
conf
DOI
10.1109/ULTSYM.2012.0552
Filename
6562352
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