Title :
Thin membrane supported millimeter wave micromachined filters
Author :
Muller, A. ; Constantinidis, G. ; Giaccomozzi ; Lagadas, M. ; Deligeorgis, G. ; Iordanescu, S. ; Petrini, I. ; Vasilache, D. ; Marcelli, R. ; Bartolucci, G. ; Neculoiu, D. ; Blondy, P. ; Dascalu
Author_Institution :
IMT Bucharest, Romania
Abstract :
This paper presents, the manufacturing of micromachined filters for 38 and 77 GHz using two different type of structures: the first filter structures have as support a 1.5 μm SiO2/Si3 N4/SiO2 membrane; the second type of filter structures are supported on 2.2 μm thin GaAs/AlGaAs membrane. These membranes were manufactured using selective dry etching techniques with AlGaAs as an etch-stop layer. On wafer measurements of the filter structures were performed. For the GaAs based micromachined filters, losses less than 1.5 dB at 38 GHz and less than 2 dB at 77 GHz have been obtained
Keywords :
S-parameters; band-pass filters; frequency response; membranes; micromachining; millimetre wave circuits; millimetre wave filters; passive filters; sputter etching; 1.5 dB; 1.5 micron; 2 dB; 2.2 micron; 38 GHz; 77 GHz; GaAs; GaAs-AlGaAs; GaAs/AlGaAs membrane; RIE; S parameters; SiO2-Si3N4-SiO2; SiO2/Si3N4/SiO2 membrane; band-pass filters; double-folded CPW; etch-stop layer; filter manufacture; frequency response; low losses; millimeter wave micromachined filters; on-wafer measurements; passive circuit elements; selective dry etching; thin membrane supported; Biomembranes; Dielectric substrates; Dry etching; Filters; Gallium arsenide; Integrated circuit technology; Micromachining; Microwave technology; Silicon; Wet etching;
Conference_Titel :
Semiconductor Conference, 2000. CAS 2000 Proceedings. International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-5885-6
DOI :
10.1109/SMICND.2000.889124
