DocumentCode :
2693833
Title :
Microphysical characterization and residual stress analysts of thin polyimide membranes on GaAs substrate, support for micromachined structures
Author :
Petrini, I. ; Muller, A. ; Iordanescu, S. ; Vasilache, D. ; Constantinidis, G. ; Giacomozzi, Flavio ; Anton, C.
Author_Institution :
IMT, Bucharest, Romania
Volume :
2
fYear :
2000
fDate :
2000
Firstpage :
455
Abstract :
This paper presents measurements of micromechanical properties of thin polyimide membranes realised by micromachining of SI GaAs substrate, as well as the residual stress analysis of these membranes. AFM, SEM, and white light interferometry as well as a residual stress measurement procedure, have been used
Keywords :
atomic force microscopy; etching; gallium arsenide; internal stresses; light interferometry; membranes; micromachining; polymer films; scanning electron microscopy; stress analysis; surface topography; thermal stresses; AFM; GaAs; SEM; etch stop layer; filter structure; meander-line inductor; micromachined structure support; micromachining; micromechanical properties; microphysical characterization; microwave circuit elements; planarity; residual stress analysis; residual stress measurement; roughness analysis; semi-insulating substrate; thermal stresses; thin polyimide membranes; wet etching; white light interferometry; Biomembranes; Circuits; Gallium arsenide; Inductors; Micromachining; Polyimides; Residual stresses; Scanning electron microscopy; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 2000. CAS 2000 Proceedings. International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-5885-6
Type :
conf
DOI :
10.1109/SMICND.2000.889130
Filename :
889130
Link To Document :
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