Microphysical characterization and residual stress analysts of thin polyimide membranes on GaAs substrate, support for micromachined structures

Author

Petrini, I. ; Muller, A. ; Iordanescu, S. ; Vasilache, D. ; Constantinidis, G. ; Giacomozzi, Flavio ; Anton, C.

Author_Institution

IMT, Bucharest, Romania

Volume

2

fYear

2000

fDate

2000

Firstpage

455

Abstract

This paper presents measurements of micromechanical properties of thin polyimide membranes realised by micromachining of SI GaAs substrate, as well as the residual stress analysis of these membranes. AFM, SEM, and white light interferometry as well as a residual stress measurement procedure, have been used

Keywords

atomic force microscopy; etching; gallium arsenide; internal stresses; light interferometry; membranes; micromachining; polymer films; scanning electron microscopy; stress analysis; surface topography; thermal stresses; AFM; GaAs; SEM; etch stop layer; filter structure; meander-line inductor; micromachined structure support; micromachining; micromechanical properties; microphysical characterization; microwave circuit elements; planarity; residual stress analysis; residual stress measurement; roughness analysis; semi-insulating substrate; thermal stresses; thin polyimide membranes; wet etching; white light interferometry; Biomembranes; Circuits; Gallium arsenide; Inductors; Micromachining; Polyimides; Residual stresses; Scanning electron microscopy; Silicon; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 2000. CAS 2000 Proceedings. International

Conference_Location

Sinaia

Print_ISBN

0-7803-5885-6

Type

conf

DOI

10.1109/SMICND.2000.889130

Filename

889130