DocumentCode :
2694100
Title :
Single crystal PZT thin film membrane with highly conductive electrodes
Author :
Yin, Sha ; Abergel, J. ; Bontempi, A. ; Ricart, T. ; Le Rhun, G. ; Defay, E. ; Niu, Guolin ; Vilquin, B. ; Gautier, B. ; Robach, Y.
Author_Institution :
CEA-LETI, Grenoble, France
fYear :
2012
fDate :
7-10 Oct. 2012
Firstpage :
792
Lastpage :
794
Abstract :
Piezoelectric membrane based on single crystalline Pb(Zr0.52Ti0.48)O3 (PZT) thin film on (001) Si substrate is reported in this paper. To obtain epitaxial single crystalline PZT thin film, SrTiO3 (STO) buffer layer was grown by Molecular Beam Epitaxy on Si substrate, which has been proven as an effective way to increase the crystalline quality. 70nm-thick PZT thin film was deposited on STO-buffered Si substrate by the sol-gel method. 100nm-thick Ru top electrode was patterned by wet etching and subsequently 200nm-thick SiO2 elastic layer was deposited on the top of the stack in order to mechanically strengthen the final membrane. Deep reactive ion etching was therefore used to release the membrane from the backside. Finally, 100nm-thick Au bottom electrode was deposited on the backside of the membrane. Two types of membrane structures were realized, i.e. piezoelectric actuator and resonator. The resonances were studied by an impedance meter and the hysteresis loop of the electromechanical response was characterized by a Wyko profilometer.
Keywords :
epitaxial layers; ferroelectric thin films; lead compounds; membranes; molecular beam epitaxial growth; sol-gel processing; sputter etching; Si(001) substrate; Si-PZT-SrTiO3-Ru; Wyko profilometer; buffer layer; crystalline quality; deep reactive ion etching; elastic layer; electromechanical response; epitaxial single crystalline PZT thin film; highly conductive electrodes; hysteresis loop; impedance meter; mechanical strengthening; molecular beam epitaxy; piezoelectric actuator; resonances; resonator; single crystal PZT thin film membrane; size 100 nm; size 200 nm; sol-gel method; wet etching; Electrodes; Etching; Gold; Molecular beam epitaxial growth; Silicon; Substrates; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium (IUS), 2012 IEEE International
Conference_Location :
Dresden
ISSN :
1948-5719
Print_ISBN :
978-1-4673-4561-3
Type :
conf
DOI :
10.1109/ULTSYM.2012.0197
Filename :
6562385
Link To Document :
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