Title :
Transient thermal strain measurements in electronic packages
Author :
Bastawros, Adel F. ; Voloshin, Arkady S.
Author_Institution :
Dept. of Mech. Eng. & Mech., Lehigh Univ., Bethlehem, PA, USA
Abstract :
Fractional fringe moire interferometry was successfully applied to monitor thermo/mechanical strain histories in a memory device as the temperature was changing from room temperature (25°C) to an arbitrarily chosen final temperature of 80°C. Full displacement fields were recorded at different temperatures and used to predict strains in a small region at the chip corner. Moreover, strains across the chip thickness along a line close to the chip corner were investigated. A dramatic change in the pattern of axial strain growth was observed for temperatures around 70°C and above. It is suggested that the development of severe compressive stains due to bending of the package is responsible for such a change. A minor deficiency in the data collection procedure affected the accuracy of strains predicted for the selected region. This necessitated the use of a least-squares curve fitting procedure to represent deformations based on experimentally collected values. This yielded smooth strain distributions giving a clear qualitative picture of strain histories, but is introduced some errors in the strain magnitudes (10-15% of actual values)
Keywords :
VLSI; integrated memory circuits; moire fringes; packaging; strain measurement; 25 to 80 C; chip corner; electronic packages; fractional fringe moire interferometry; full displacement fields; least-squares curve fitting; memory device; package bending; pattern of axial strain growth; severe compressive stains; strain distributions; thermomechanical strain histories; transient thermal strain measurements; Capacitive sensors; Displacement measurement; Electronic packaging thermal management; Frequency; Gratings; Monitoring; Optical interferometry; Residual stresses; Strain measurement; Thermal stresses;
Conference_Titel :
Thermal Phenomena in Electronic Systems, 1990. I-THERM II., InterSociety Conference on
Conference_Location :
Las Vegas, NV
DOI :
10.1109/ITHERM.1990.113312