Title :
UV, blue, green, yellow-green and white LEDs fabricated by III-N semiconductors
Author :
Su, Y.K. ; Sheu, J.K.
Author_Institution :
Inst. of Microelectron., Cheng Kung Univ., Tainan, Taiwan
Abstract :
Recent achievements in GaN-based light-emitting diodes (LEDs), which is linked to the use of new designs, such as p+-AlGaN/GaN strained-layer superlattice (SLS) and n+-InGaN/GaN short-period superlattice (SPS) top contact layer is reported. GaN-based LEDs with low-operation voltages, which are as low as 3 V (at 20 mA ) even lower, can be achieved by the use of these heavy-doped layers. In addition, conventional transparent conductive oxide, such as indium tin oxide (ITO), can be served as a transparent top contact layer in GaN-based LEDs other than thin metal film such as Ni/Au. Luminescence intensity in visible GaN-based LEDs can be significantly improved by this new design due to the high-transparency top contact layer. In the recent achievements, white LEDs including a variety of designs, such as phosphor-containing and phosphor-less device structures, will also be reported. Specifically, the high-efficiency yellow-green (λ∼565 nm) LEDs based on InGaN/GaN MQW emitting layers, which the luminescence intensity is comparable with the conventional AlGaInP yellow-green (λ∼575 nm) LEDs is achieved. This high-efficiency InGaN/GaN yellow-green LED makes a single-chip complementary white LED possible.
Keywords :
III-V semiconductors; aluminium compounds; electroluminescence; gallium compounds; gold; light emitting diodes; metallic thin films; nickel; phosphors; semiconductor quantum wells; semiconductor superlattices; tin compounds; wide band gap semiconductors; 20 mA; 3 V; AlGaN-GaN; GaN-based LEDs; GaN-based light-emitting diodes; III-N semiconductors; ITO-GaN; InGaN-GaN; InGaN/GaN MQW emitting layers; InSnO-GaN; Ni-Au; UV LEDs; blue LEDs; conventional AlGaInP yellow-green; conventional transparent conductive oxide; heavy-doped layers; high-efficiency InGaN/GaN yellow-green LED; high-transparency top contact layer; indium tin oxide; low-operation voltages; luminescence intensity; n+-InGaN/GaN short-period superlattice top contact layer; p+-AlGaN/GaN strained-layer superlattice; phosphor-containing device structures; phosphor-less device structures; single-chip complementary white LED; thin metal film; white LEDs; yellow-green LEDs; Conductive films; Gallium nitride; Gold; Indium tin oxide; Laser sintering; Light emitting diodes; Luminescence; Quantum well devices; Semiconductor superlattices; Voltage;
Conference_Titel :
Optoelectronics, Proceedings of the Sixth Chinese Symposium
Print_ISBN :
0-7803-7887-3
DOI :
10.1109/COS.2003.1278151