DocumentCode :
2696685
Title :
Large-area monolithic photonic crystal mirrors with high reflectivity in the 1250–1650nm band patterned by optical lithography
Author :
Jung, Il Woong ; Mallick, Shrestha Basu ; Solgaard, Olav
Author_Institution :
Dept. of Electr. Eng., Stanford Univ., Stanford, CA
fYear :
2008
fDate :
11-14 Aug. 2008
Firstpage :
86
Lastpage :
87
Abstract :
This paper describes large area (500 mum - 500 mum) monolithic 2-D photonic crystals (PC) for applications as high-reflectivity, broad-band mirrors in the near-IR (infra-red) spectrum. These large PC mirrors were patterned using an ASM-L i-line stepper to achieve minimum feature sizes of less than 100 nm. The reflectivity spectrum of the mirrors show that the high reflectivity (>90%) bands can be shifted in wavelength by varying the hole sizes of the photonic crystal to cover the 400 nm near-IR band from 1250 nm-1650 nm.
Keywords :
micromirrors; optical fabrication; optical materials; photolithography; photonic crystals; reflectivity; ASM-L i-line stepper; broad-band mirrors; monolithic photonic crystal mirror; near-IR spectrum; optical lithography; reflectivity; wavelength 1250 nm to 1650 nm; Etching; Fabrication; Lithography; Mirrors; Optical films; Oxidation; Personal communication networks; Photonic crystals; Reflectivity; Silicon; GOPHER; Photonic crystal; broad-band; monolithic;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical MEMs and Nanophotonics, 2008 IEEE/LEOS Internationall Conference on
Conference_Location :
Freiburg
Print_ISBN :
978-1-4244-1917-3
Electronic_ISBN :
978-1-4244-1918-0
Type :
conf
DOI :
10.1109/OMEMS.2008.4607841
Filename :
4607841
Link To Document :
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