• DocumentCode
    2696685
  • Title

    Large-area monolithic photonic crystal mirrors with high reflectivity in the 1250–1650nm band patterned by optical lithography

  • Author

    Jung, Il Woong ; Mallick, Shrestha Basu ; Solgaard, Olav

  • Author_Institution
    Dept. of Electr. Eng., Stanford Univ., Stanford, CA
  • fYear
    2008
  • fDate
    11-14 Aug. 2008
  • Firstpage
    86
  • Lastpage
    87
  • Abstract
    This paper describes large area (500 mum - 500 mum) monolithic 2-D photonic crystals (PC) for applications as high-reflectivity, broad-band mirrors in the near-IR (infra-red) spectrum. These large PC mirrors were patterned using an ASM-L i-line stepper to achieve minimum feature sizes of less than 100 nm. The reflectivity spectrum of the mirrors show that the high reflectivity (>90%) bands can be shifted in wavelength by varying the hole sizes of the photonic crystal to cover the 400 nm near-IR band from 1250 nm-1650 nm.
  • Keywords
    micromirrors; optical fabrication; optical materials; photolithography; photonic crystals; reflectivity; ASM-L i-line stepper; broad-band mirrors; monolithic photonic crystal mirror; near-IR spectrum; optical lithography; reflectivity; wavelength 1250 nm to 1650 nm; Etching; Fabrication; Lithography; Mirrors; Optical films; Oxidation; Personal communication networks; Photonic crystals; Reflectivity; Silicon; GOPHER; Photonic crystal; broad-band; monolithic;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical MEMs and Nanophotonics, 2008 IEEE/LEOS Internationall Conference on
  • Conference_Location
    Freiburg
  • Print_ISBN
    978-1-4244-1917-3
  • Electronic_ISBN
    978-1-4244-1918-0
  • Type

    conf

  • DOI
    10.1109/OMEMS.2008.4607841
  • Filename
    4607841