DocumentCode :
2696735
Title :
Optical characterization of the narrow-band filter with in-situ thickness monitoring at fixed wavelength
Author :
Miao, Jian ; Chen, Da-Yu ; Zhang, Rong-Jun ; Li, Li ; Wu, Yun-Hua ; Chen, Liang-Yao
Author_Institution :
Dept. of Opt. Sci. & Eng., Fudan Univ., Shanghai, China
fYear :
2003
fDate :
12-14 Sept. 2003
Firstpage :
82
Lastpage :
84
Abstract :
For application in the optical communication field, the narrow band TFF device with 4 cavities has been studied. By carefully analyzing the data, it was found that slight uncertainty of the optical thickness occurred at the turning point will cause phase errors that cannot be exactly corrected by the compensation algorithm and will deteriorate the spectral pattern. An improved method to in-situ monitor the film growth process in the full optical spectral range is suggested.
Keywords :
infrared spectra; optical communication equipment; optical multilayers; optical waveguide filters; film growth process; in-situ thickness monitoring; multilayered thin film filters; narrow band TFF device; narrow-band filter; optical characterization; optical communication field; optical spectral range; optical thickness; phase errors; spectral pattern; Algorithm design and analysis; Data analysis; Monitoring; Narrowband; Optical fiber communication; Optical films; Optical filters; Pattern analysis; Turning; Uncertainty;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronics, Proceedings of the Sixth Chinese Symposium
Print_ISBN :
0-7803-7887-3
Type :
conf
DOI :
10.1109/COS.2003.1278170
Filename :
1278170
Link To Document :
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