• DocumentCode
    2696772
  • Title

    Optical scanner with deformable mirror fabricated from SOI wafer

  • Author

    Sasaki, Takashi ; Hane, Kazuhiro

  • Author_Institution
    Dept. of Nanomech., Tohoku Univ., Sendai
  • fYear
    2008
  • fDate
    11-14 Aug. 2008
  • Firstpage
    96
  • Lastpage
    97
  • Abstract
    An optical scanner with a deformable mirror is fabricated using SOI wafer. A 1 mum thick top silicon layer of SOI wafer is used to fabricate a deformable mirror. Movable comb and fixed comb are fabricated from the silicon substrate. The mirror is rotated by the comb actuator and it is also deformed by an electrostatic force independently. The rotation angle of the mirror is 12 degrees at 80 V. The deformation at the mirror center is 3 nm at 100 V.
  • Keywords
    electrostatic actuators; mirrors; optical fabrication; optical scanners; silicon-on-insulator; surface roughness; SOI wafer; Si; comb actuator; deformable mirror; electronic connections; electrostatic force; optical scanner; rotation angle; silicon substrate; surface roughness; voltage 100 V; voltage 80 V; Counting circuits; Electrodes; Etching; Gold; Mirrors; Optical films; Semiconductor films; Silicon; Substrates; Voltage; SOI wafer; scanner; wave front control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical MEMs and Nanophotonics, 2008 IEEE/LEOS Internationall Conference on
  • Conference_Location
    Freiburg
  • Print_ISBN
    978-1-4244-1917-3
  • Electronic_ISBN
    978-1-4244-1918-0
  • Type

    conf

  • DOI
    10.1109/OMEMS.2008.4607846
  • Filename
    4607846