Title :
Evaluation of X-ray reflectivity of a MEMS X-ray optic
Author :
Mitsuishi, I. ; Ezoe, Y. ; Koshiishi, M. ; Mita, M. ; Maeda, Y. ; Yamasaki, N.Y. ; Mitsuda, K. ; Shirata, T. ; Hayashi, T. ; Takano, T. ; Maeda, R.
Author_Institution :
Inst. of Space & Astronaut. Sci. (ISAS), Japan Aerosp. Exploration Agency (JAXA), Tokyo
Abstract :
X-ray reflectivity of an ultra light-weight X-ray optic using MEMS technologies was measured in two different energies (0.28 keV and 1.49 keV). The obtained reflectivities can be understood by considering the mirror surface structures.
Keywords :
X-ray imaging; X-ray optics; X-ray reflection; micro-optomechanical devices; micromirrors; MEMS technology; X-ray imaging; X-ray mirror; X-ray reflectivity; anisotropic wet etching; deep dry ion etching; electron volt energy 0.28 keV; electron volt energy 1.49 keV; mirror surface structures; optical fabrication; ultra light-weight X-ray optics; Geometrical optics; Micromechanical devices; Mirrors; Optical refraction; Particle beam optics; Reflectivity; Rough surfaces; Semiconductor device measurement; Surface roughness; X-ray imaging;
Conference_Titel :
Optical MEMs and Nanophotonics, 2008 IEEE/LEOS Internationall Conference on
Conference_Location :
Freiburg
Print_ISBN :
978-1-4244-1917-3
Electronic_ISBN :
978-1-4244-1918-0
DOI :
10.1109/OMEMS.2008.4607850
