Title :
Long-period waveguide gratings
Author :
Tsoi, H.C. ; Wong, W.H. ; Pun, E.Y.B.
Author_Institution :
Dept. of Electron. Eng., City Univ. of Hong Kong, Kowloon, China
Abstract :
Long period waveguide gratings (LPWG) based on a low-loss negative tone epoxy Novolak resin polymer have been fabricated on SiO2/Si substrate using standard cleanroom processes: UV photolithography and reactive ion etching. A maximum attenuation of -18 dB and a minimum 3 dB bandwidth of 6 nm were measured, and the grating length is as short as 1 cm.
Keywords :
diffraction gratings; integrated optics; optical fabrication; optical polymers; optical waveguide components; sputter etching; ultraviolet lithography; Novolak resin polymer; Si; SiO2-Si; UV photolithography; attenuation; long-period waveguide gratings; negative tone epoxy; reactive ion etching; standard cleanroom processes; Erbium-doped fiber amplifier; Etching; Gratings; Lithography; Optical fiber filters; Optical polymers; Optical refraction; Optical surface waves; Optical variables control; Optical waveguides;
Conference_Titel :
Optoelectronics, Proceedings of the Sixth Chinese Symposium
Print_ISBN :
0-7803-7887-3
DOI :
10.1109/COS.2003.1278185
