• DocumentCode
    2697222
  • Title

    Design and fabrication of compact etched diffraction grating demultiplexers based on α-Si nanowire technology

  • Author

    Song, Jun ; Zhu, Ning

  • Author_Institution
    Centre for Opt. & Electromagn. Res., Zhejiang Univ., Hangzhou
  • fYear
    2008
  • fDate
    11-14 Aug. 2008
  • Firstpage
    148
  • Lastpage
    149
  • Abstract
    Silicon nanowire waveguides and related etched diffraction grating (EDG) demultiplexers are studied by alpha-Si-on-SiO2 technology. Compact EDG demultiplexers with 10 nm spacing for both echelle and total-internal-reflection (TIR) facets have been fabricated and characterized.
  • Keywords
    demultiplexing equipment; diffraction gratings; elemental semiconductors; nanotechnology; nanowires; optical communication equipment; optical design techniques; optical fabrication; optical waveguide components; silicon; silicon-on-insulator; EDG demultiplexers; Si-SiO2; echelle; etched diffraction grating demultiplexer design; silicon nanowire waveguides; total-internal-reflection facet fabrication; Arrayed waveguide gratings; Diffraction gratings; Electromagnetic waveguides; Etching; Fabrication; Optical scattering; Optical waveguides; Scanning electron microscopy; Silicon; Tellurium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical MEMs and Nanophotonics, 2008 IEEE/LEOS Internationall Conference on
  • Conference_Location
    Freiburg
  • Print_ISBN
    978-1-4244-1917-3
  • Electronic_ISBN
    978-1-4244-1918-0
  • Type

    conf

  • DOI
    10.1109/OMEMS.2008.4607872
  • Filename
    4607872
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2697222