DocumentCode :
2697231
Title :
Use of random telegraph signal as internal probe to study program/erase charge lateral spread in a SONOS flash memory
Author :
Chou, Y.L. ; Chiu, J.P. ; Ma, H.C. ; Wang, Tahui ; Chao, Y.P. ; Chen, K.C. ; Lu, Chih-Yuan
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao-Tung Univ., Hsinchu, Taiwan
fYear :
2010
fDate :
2-6 May 2010
Firstpage :
960
Lastpage :
963
Abstract :
A novel random telegraph signal (RTS) method is proposed to study the lateral spread of injected charges in program/erase of a NOR-type SONOS flash memory. The concept is to use RTS to extract an interface trap position and to detect a local potential variation near the trap due to injection of program/erase charges. By using this method, we find that CHISEL program has a broader charge distribution than CHE program. A mismatch of CHE program electrons and band-to-band erase holes is observed directly from this method.
Keywords :
charge injection; flash memories; interface states; logic gates; CHE program electrons; CHISEL program; NOR-type SONOS flash memory; RTS method; band-to-band erase holes; charge distribution; interface trap position; internal probe; local potential variation; program/erase charge injection; random telegraph signal; Channel hot electron injection; Charge carrier processes; Data mining; Electron traps; Flash memory; Hot carriers; Probes; SONOS devices; Telegraphy; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2010 IEEE International
Conference_Location :
Anaheim, CA
ISSN :
1541-7026
Print_ISBN :
978-1-4244-5430-3
Type :
conf
DOI :
10.1109/IRPS.2010.5488696
Filename :
5488696
Link To Document :
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