• DocumentCode
    269815
  • Title

    Design and fabrication of hollow out-of-plane silicon microneedles

  • Author

    Jurčíček, Petr ; Zou, Hailin ; Shuiping Zhang ; Chong Liu

  • Author_Institution
    Res. Center for Micro Syst. Technol. (MST), Dalian Univ. of Technol., Dalian, China
  • Volume
    8
  • Issue
    2
  • fYear
    2013
  • fDate
    Feb-13
  • Firstpage
    78
  • Lastpage
    81
  • Abstract
    The design and fabrication of hollow out-of-plane silicon microneedles that mimic the function and dimensions of a mosquito´s mouthparts are proposed. Two-step etching and deep reactive ion etching from both sides of the wafer were used to etch the boreholes completely and to ensure the holes have lateral smoothness. Microneedles composed of {411} exterior crystal planes were formed by anisotropic etching in 40% KOH solution at a water-bath temperature of 87°C. Finally, hollow silicon microneedles with a shank height of 100-120 μm and needle borehole diameter of 10-25 μm were fabricated. Flow rate tests using hollow microneedles were performed and demonstrated that the correlation between the flow rate and the inner diameter follows the Hagen-Poiseuille law. Sample tests were performed using pig skin and have shown that the microneedles have sufficient strength to withstand breakup. The microneedles, that the authors fabricated by using the microelectromechanical system, have potential applications in painless transdermal drug delivery systems.
  • Keywords
    Poiseuille flow; elemental semiconductors; microfluidics; pipe flow; semiconductor growth; silicon; sputter etching; Hagen-Poiseuille law; Si; anisotropic etching; deep reactive ion etching; flow rate tests; hollow out-of-plane silicon microneedle design; hollow out-of-plane silicon microneedle fabrication; inner diameter; lateral smoothness; microelectromechanical system; mosquito mouthpart dimensions; mosquito mouthpart function; needle borehole diameter; painless transdermal drug delivery systems; pig skin; shank height; size 10 mum to 25 mum; size 100 mum to 120 mum; temperature 87 degC; two-step etching; water-bath temperature; {411} exterior crystal planes;
  • fLanguage
    English
  • Journal_Title
    Micro & Nano Letters, IET
  • Publisher
    iet
  • ISSN
    1750-0443
  • Type

    jour

  • DOI
    10.1049/mnl.2012.0903
  • Filename
    6545160