DocumentCode :
2698291
Title :
Statistical evaluation of dynamic junction leakage current fluctuation using a simple arrayed capacitors circuit
Author :
Abe, Kenichi ; Fujisawa, Takafumi ; Suzuki, Hiroyoshi ; Watabe, Shunichi ; Kuroda, Rihito ; Sugawa, Shigetoshi ; Teramoto, Akinobu ; Ohmi, Tadahiro
Author_Institution :
Grad. Sch. of Eng., Tohoku Univ., Sendai, Japan
fYear :
2010
fDate :
2-6 May 2010
Firstpage :
683
Lastpage :
688
Abstract :
We investigate statistical behaviors of steady-state p-n junction leakage currents at source/drain of MOSFET devices (Ileaks) and dynamic fluctuations of Ileaks using a newly developed test circuit. The test circuit can acquire the leakage currents from 28,672 n+-p diodes in 7.7 s with 10 times averaging with the range from 0.1 fA to 23 fA. We demonstrate that two normal distributions exist in the steady-state (time averaging) Ileak distributions, which have different temperature dependency. A distribution of the activation energy which extracted from temperature dependence of Ileak is also revealed. Dynamic fluctuation of Ileak can be measured precisely with a simple configuration to execute pseudo parallel sampling among numerous samples for a long time. It can clarify a positive correlation between mean values of Ileak (<;Ileak>) and amplitudes of quantum fluctuation of Ileak (ΔIleak).
Keywords :
MOSFET; capacitors; leakage currents; p-n junctions; statistical analysis; MOSFET devices; activation energy distribution; arrayed capacitor circuit; current 0.1 fA to 23 fA; dynamic junction leakage current fluctuation; leakage currents; pseudoparallel sampling; quantum fluctuation current amplitudes; statistical evaluation; steady-state p-n junction leakage currents; temperature dependency; test circuit; time 7.7 s; Capacitors; Circuit testing; Diodes; Fluctuations; Gaussian distribution; Leakage current; MOSFET circuits; P-n junctions; Steady-state; Temperature dependence; MOSFET; dynamic random access memory (DRAM); p-n junction leakage current; random telegraph signal (RTS); retention time; test circuit;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2010 IEEE International
Conference_Location :
Anaheim, CA
ISSN :
1541-7026
Print_ISBN :
978-1-4244-5430-3
Type :
conf
DOI :
10.1109/IRPS.2010.5488751
Filename :
5488751
Link To Document :
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