DocumentCode
2698527
Title
New scaling limitation of the floating gate cell in NAND Flash Memory
Author
Kim, Yong Seok ; Lee, Dong Jun ; Lee, Chi Kyoung ; Choi, Hyun Ki ; Kim, Seong Soo ; Song, Jai Hyuk ; Song, Du Heon ; Choi, Jeong-Hyuk ; Suh, Kang-Deog ; Chung, Chilhee
Author_Institution
Semicond. Bus. Div., Samsung Electron. Co., Yongin, South Korea
fYear
2010
fDate
2-6 May 2010
Firstpage
599
Lastpage
603
Abstract
As the scaling in NAND Flash Memory is progressed, the various interferences among the adjacent cells are more and more increased and the new phenomenon which is ignored until now has to be considered. In this paper, we will introduce the new program interference phenomenon which is generated between the program word line and the adjacent word lines along the bit-line. This new program interference is that the Vth´s of the adjacent word lines along the bit-line are decreased while a word line is programming. Because this phenomenon is severely aggravated as the gate space is decreased, we have to consider this program interference for the future technology nodes.
Keywords
NAND circuits; flash memories; NAND flash memory; adjacent cells; adjacent word lines; floating gate cell; program interference phenomenon; scaling limitation; Business communication; Extraterrestrial phenomena; FETs; Interference; Nonvolatile memory; Parasitic capacitance; Signal generators; Space technology; Testing; Voltage control; Floating Gate Type NAND Flash; Scaling Limitation; interference;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium (IRPS), 2010 IEEE International
Conference_Location
Anaheim, CA
ISSN
1541-7026
Print_ISBN
978-1-4244-5430-3
Type
conf
DOI
10.1109/IRPS.2010.5488765
Filename
5488765
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