• DocumentCode
    2698991
  • Title

    Mechanical integrity failure of bulk-micromachined Si wafers: Influence of structure geometry and wafer handling

  • Author

    Bartek, M.

  • Author_Institution
    Delft Univ. of Technol., Netherlands
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    227
  • Lastpage
    230
  • Abstract
    Mechanical stability and strength of bulk-micromachined silicon wafers has been studied to optimize the fabrication sequence and design for maximum yield. The effects of geometry parameters (e.g. fill factor, membrane thickness) were investigated. Results show that under the condition of reasonable geometries (limited etch depth) and a proper wafer handling the bulk-micromachined trenches and recesses do not cause any significant decrease in the mechanical-integrity-failure related yield. Very thin (<10 μm) Si membranes, on the other hand, are very sensitive to any mechanical loads and more elaborated fabrication sequence is required to guarantee a reasonable yield
  • Keywords
    elemental semiconductors; mechanical strength; membranes; micromachining; silicon; 10 mum; Si; bulk-micromachined Si wafers; bulk-micromachined silicon wafers; bulk-micromachined trenches; design; fabrication sequence; fill factor; geometry parameters; limited etch depth; maximum yield; mechanical integrity failure; mechanical stability; mechanical-integrity-failure related yield; membrane thickness; recesses; strength; structure geometry; thin Si membranes; wafer handling; Anisotropic magnetoresistance; Biomembranes; Etching; Fabrication; Geometry; Micromachining; Radio frequency; Silicon; Stability; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Devices and Microsystems, 2000. ASDAM 2000. The Third International EuroConference on
  • Conference_Location
    Smolenice
  • Print_ISBN
    0-7803-5939-9
  • Type

    conf

  • DOI
    10.1109/ASDAM.2000.889487
  • Filename
    889487