DocumentCode :
2698991
Title :
Mechanical integrity failure of bulk-micromachined Si wafers: Influence of structure geometry and wafer handling
Author :
Bartek, M.
Author_Institution :
Delft Univ. of Technol., Netherlands
fYear :
2000
fDate :
2000
Firstpage :
227
Lastpage :
230
Abstract :
Mechanical stability and strength of bulk-micromachined silicon wafers has been studied to optimize the fabrication sequence and design for maximum yield. The effects of geometry parameters (e.g. fill factor, membrane thickness) were investigated. Results show that under the condition of reasonable geometries (limited etch depth) and a proper wafer handling the bulk-micromachined trenches and recesses do not cause any significant decrease in the mechanical-integrity-failure related yield. Very thin (<10 μm) Si membranes, on the other hand, are very sensitive to any mechanical loads and more elaborated fabrication sequence is required to guarantee a reasonable yield
Keywords :
elemental semiconductors; mechanical strength; membranes; micromachining; silicon; 10 mum; Si; bulk-micromachined Si wafers; bulk-micromachined silicon wafers; bulk-micromachined trenches; design; fabrication sequence; fill factor; geometry parameters; limited etch depth; maximum yield; mechanical integrity failure; mechanical stability; mechanical-integrity-failure related yield; membrane thickness; recesses; strength; structure geometry; thin Si membranes; wafer handling; Anisotropic magnetoresistance; Biomembranes; Etching; Fabrication; Geometry; Micromachining; Radio frequency; Silicon; Stability; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 2000. ASDAM 2000. The Third International EuroConference on
Conference_Location :
Smolenice
Print_ISBN :
0-7803-5939-9
Type :
conf
DOI :
10.1109/ASDAM.2000.889487
Filename :
889487
Link To Document :
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