DocumentCode
2699771
Title
Effects of negative differential resistance in high power devices and some relations to DMOS structures
Author
Baburske, Roman ; Lutz, Josef ; Heinze, Birk
Author_Institution
EMC, Chemnitz Univ. of Technol., Chemnitz, Germany
fYear
2010
fDate
2-6 May 2010
Firstpage
162
Lastpage
169
Abstract
Due to the feedback of free carriers to the electric field, branches with negative differential resistance (NDR) occur in high power devices. NDR usually leads to current filaments. These current filaments might be non-destructive if they move. Most critical effects are found if impact ionization occurs at the n--n+-junction with a positive electrical feedback to avalanche or dynamic avalanche at the pn-junction. Against dangerous double-sided dynamic avalanche, countermeasures have been found in high power devices. These structures suppress or limit the formation of electric fields at the n--n+-junction. They lead to devices with dramatically increased ruggedness. Even if ESD and DMOS devices operate at lower voltage, the very high current density levels lead to a density of free carriers above the specific doping of the layer, and free carriers dominate the shape of the electric field. Similar effects of negative differential resistance and moving filaments have been found in ESD protection devices. Snap-back effects have been found in DMOS devices. Possible relations are discussed.
Keywords
MOSFET; electrostatic discharge; p-n junctions; power semiconductor diodes; semiconductor device reliability; DMOS device structures; ESD protection devices; current density levels; double-sided dynamic avalanche; electric field; free carrier feedback density; high power devices; impact ionization; n--n+-junction; negative differential resistance effect; p-n junction; positive electrical feedback; snapback effects; Avalanche breakdown; Current density; Doping; Electric resistance; Electrostatic discharge; Semiconductor diodes; Shape; Stress; Switches; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium (IRPS), 2010 IEEE International
Conference_Location
Anaheim, CA
ISSN
1541-7026
Print_ISBN
978-1-4244-5430-3
Type
conf
DOI
10.1109/IRPS.2010.5488835
Filename
5488835
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