DocumentCode
2699853
Title
Low Loss and Slow Light Photonic Crystal Waveguides in SOI
Author
Krauss, Thomas F. ; O´Faolain, Liam ; Settle, Michael ; Michaeli, Albert ; Salib, Michael
Author_Institution
Sch. of Phys. & Astron., Saint Andrews Univ.
Volume
2
fYear
2006
fDate
18-22 June 2006
Firstpage
91
Lastpage
93
Abstract
Photonic crystal waveguides have evolved from an academic curiosity to an area where practical applications are beginning to appear feasible. Waveguides consisting of a single line of missing holes ("W1") have become the benchmark to assess fabrication quality, and losses of order 10 dB/cm and below are now possible. We discuss fabrication aspects of such waveguides, made both by e-beam and by deep UV lithography, and highlight some of the key requirements for low loss operation. While these results are very encouraging, true functionality arises from the exploitation of dispersive effects, especially operation in the "slow wave" regime. Novel designs enabling non-dispersive slow wave operation with considerable bandwidth are discussed
Keywords
electron beam lithography; integrated optics; optical dispersion; optical fabrication; optical losses; optical waveguides; photonic crystals; silicon-on-insulator; ultraviolet lithography; Si-SiO2; deep ultraviolet lithography; dispersive effects; electron-beam lithography; low loss operation; low loss waveguides; nondispersive slow wave operation; photonic crystal waveguides; silicon-on-insulator; slow light regime; slow light waveguides; waveguide fabrication; Bandwidth; Etching; Lithography; Optical device fabrication; Optical losses; Optical propagation; Optical waveguides; Photonic crystals; Propagation losses; Slow light; dispersion engineering; low loss propagation; photonic crystal; slow light;
fLanguage
English
Publisher
ieee
Conference_Titel
Transparent Optical Networks, 2006 International Conference on
Conference_Location
Nottingham
Print_ISBN
1-4244-0235-2
Electronic_ISBN
1-4244-0236-0
Type
conf
DOI
10.1109/ICTON.2006.248345
Filename
4013741
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