DocumentCode

2701068

Title

The distribution of boron and arsenic in SOI wafers implementing SIMS

Author

Biswas, Santosh ; Kelly, Ivan ; Kirkwood, D. ; Collart, E.

fYear

2002

fDate

22-27 Sept. 2002

Firstpage

1

Lastpage

4

fLanguage

English

Publisher

ieee

Conference_Titel

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on

Print_ISBN

0-7803-7155-0

Type

conf

DOI

10.1109/IIT.2002.1278881

Filename

1278881