• DocumentCode
    2701248
  • Title

    Evaluations for a highly scalable, reliable vertical channel SONOS memory

  • Author

    Huang, Y.F. ; Chen, K.F. ; Chen, K.Y. ; Wei, K.L. ; Chen, Y.J. ; Hsu, M.C. ; Wu, G.W. ; Yang, I.C. ; Han, T.T. ; Chong, L.H. ; Gu, S.H. ; Zous, N.K. ; Chen, M.S. ; Lu, W.P. ; Chen, K.C. ; Lu, Chih-Yuan

  • Author_Institution
    Macronix Int. Co., Ltd., Hsinchu, Taiwan
  • fYear
    2010
  • fDate
    26-28 April 2010
  • Firstpage
    59
  • Lastpage
    60
  • Abstract
    A vertical channel SONOS memory, which is compatible with current CMOS process and has four physical storage nodes per unit area, is fabricated and electrically evaluated. Comparing with a planar device, the array cell tuning is much easier since the channel length is no longer limited by array area. After reviewing key performances including program/erase (P/E) speeds, second bit effect, program disturbance, endurance, and retention on a NOR-type array, it is found that four physical bits/cell is hard to achieve due to a serious program disturb. Unavoidable high energy 2nd hot electron between neighbor cells is identified as the root cause. In this paper, operation procedures and array layouts, which are suitable for three physical bits per cell (3bits/cell), is then proposed.
  • Keywords
    CMOS memory circuits; NOR circuits; integrated memory circuits; CMOS process; NOR-type array; high energy 2nd hot electron; physical storage; vertical channel SONOS memory; CMOS process; Channel hot electron injection; Charge carrier processes; Degradation; Hot carriers; Interface states; Merging; SONOS devices; Temperature; Virtual colonoscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology Systems and Applications (VLSI-TSA), 2010 International Symposium on
  • Conference_Location
    Hsinchu
  • ISSN
    1524-766X
  • Print_ISBN
    978-1-4244-5063-3
  • Electronic_ISBN
    1524-766X
  • Type

    conf

  • DOI
    10.1109/VTSA.2010.5488947
  • Filename
    5488947