DocumentCode :
2701600
Title :
Channel material optimization for the ultimate planar and nanowire mosfets: a theoretical exploration
Author :
Wang, Jing ; Lundstrom, Mark
Volume :
1
fYear :
2005
fDate :
June 20-22, 2005
Firstpage :
241
Lastpage :
242
Keywords :
Degradation; Effective mass; FETs; III-V semiconductor materials; Logic devices; MOSFETs; Modems; Quantum capacitance; Quantum cascade lasers; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference Digest, 2005. DRC '05. 63rd
Print_ISBN :
0-7803-9040-7
Type :
conf
DOI :
10.1109/DRC.2005.1553139
Filename :
1553139
Link To Document :
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