Title :
Measurement of the Spatial Uniformity of a Large Field Microstructured Retarder
Author :
Urbanczyk, Adam ; Schumann, Melanie ; Bläsi, Benedikt ; Gombert, Andreas
Author_Institution :
Inst. of Phys., Wroclaw Univ. of Technol.
Abstract :
We report on experimental characterization of a microstructured optical retarder fabricated using interference lithography technique. The microstructured element is designed to be a quarter-wave plate in visible range. The measurements of retardation distribution were carried out against wavelength in incoherent light using a rotating analyzer technique. We also investigated the dependence of retardation upon angle of incidence for two orientations of the rotation axis. The measurements showed that the birefringent microstructured element is relatively uniform and introduces 70deg retardation at lambda=510 nm
Keywords :
birefringence; micro-optics; optical design techniques; optical retarders; optical testing; photolithography; 510 nm; birefringent element; incoherent light; interference lithography; large field retarder; microstructured element; microstructured retarder; optical retarder; quarter-wave plate; retardation distribution; rotating analyzer technique; spatial uniformity measurement; Azimuth; Birefringence; Charge coupled devices; Image analysis; Interference; Lithography; Optical retarders; Polarization; Rotation measurement; Wavelength measurement; form birefringence; microstructured optical elements; retardation plate;
Conference_Titel :
Transparent Optical Networks, 2006 International Conference on
Conference_Location :
Nottingham
Print_ISBN :
1-4244-0235-2
Electronic_ISBN :
1-4244-0236-0
DOI :
10.1109/ICTON.2006.248530
