Title :
Effect of thermal residual stresses on the apparent interfacial toughness of epoxy/aluminum interface
Author :
Yao, Qizhou ; Qu, Jianmin
Author_Institution :
Center of Packaging Res., Georgia Inst. of Technol., Atlanta, GA, USA
Abstract :
In this paper, the apparent fracture toughness of the interfaces of several epoxy-based adhesives and an aluminum substrate is experimentally measured. Double layer specimens with initial interfacial cracks are made for four-point bending tests. Thermal residual stresses exist on the interface due to the coefficient of thermal expansion (CTE) mismatch between the underfill and aluminum. Silica fillers are used to modify the CTE of the epoxy-based adhesives so that various levels of interface thermal residual stresses are achieved. It is found that the apparent interfacial toughness is significantly affected by the thermal residual stress. In general, thermal residual stress undermines the interfacial crack resistance. In some cases, the residual stress is sufficient to result in adhesive and/or cohesive failure
Keywords :
adhesives; bending; encapsulation; filled polymers; fracture toughness; interface phenomena; internal stresses; mechanical testing; packaging; thermal expansion; thermal stress cracking; thermal stresses; Al; CTE mismatch; SiO2; adhesive failure; aluminum; aluminum substrate; apparent fracture toughness; apparent interfacial toughness; coefficient of thermal expansion mismatch; cohesive failure; double layer specimens; epoxy-based adhesives; epoxy/aluminum interface; four-point bending tests; initial interfacial cracks; interface thermal residual stresses; interfacial crack resistance; silica fillers; thermal residual stress; thermal residual stresses; underfill; Adhesives; Aluminum; Electronic packaging thermal management; Polymers; Residual stresses; Silicon compounds; Testing; Thermal expansion; Thermal resistance; Thermal stresses;
Conference_Titel :
Advanced Packaging Materials: Processes, Properties and Interfaces, 1999. Proceedings. International Symposium on
Conference_Location :
Braselton, GA
Print_ISBN :
0-930815-56-4
DOI :
10.1109/ISAPM.1999.757334