DocumentCode :
2703311
Title :
Interfacial adhesion of fluoropolymer composites to commercial copper foils subjected to aqueous photolithographic processes
Author :
Matienzo, L.J. ; Jimarez, L.J.
Author_Institution :
Microelectron. Div., IBM Corp., Endicott, NY, USA
fYear :
1995
fDate :
21-24 May 1995
Firstpage :
707
Lastpage :
718
Abstract :
Three commercial copper foils containing various degrees of surface roughness and a chemically similar surface treatment were laminated to a fluoropolymer composite and also subjected to water-based photolithographic and stripping processes. Surface analysis performed on the processed foils indicated that the highly basic pH of the stripping process was effective in removing zinc oxide, a component of the surface treatments on these foils. Morphologically, however, the surfaces did not seem to change. Ninety degree peel measurements of the resulting interfaces with and without a photoresist processes showed that the resulting practical adhesion seemed to be mainly controlled by mechanical interlocking and to a lesser amount, by chemical factors. When 50 μm wide lines were subjected to the photolithographic process and a full fabrication sequence, adhesion variability seemed to be affected by interfacial attack of the fluoropolymer/metal foil interface by the alkaline medium of stripping and other process chemicals. Reliable interfacial adhesion of narrow lines is only possible when process parameters have been optimized
Keywords :
adhesion; composite material interfaces; copper; filled polymers; foils; photolithography; polymer films; printed circuit manufacture; surface topography; surface treatment; 50 micron; Cu; PCB fabrication; ZnO removal; adhesion variability; alkaline medium; aqueous photolithographic processes; chemical factors; commercial Cu foils; fluoropolymer composites; fluoropolymer/metal foil interface; interfacial adhesion; mechanical interlocking; narrow line adhesion; ninety degree peel measurements; process chemicals; process parameters optimisation; stripping process; surface analysis; surface roughness; surface treatment; water-based photolithographic process; Adhesives; Chemical processes; Copper; Mechanical variables measurement; Performance analysis; Rough surfaces; Surface morphology; Surface roughness; Surface treatment; Zinc oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference, 1995. Proceedings., 45th
Conference_Location :
Las Vegas, NV
Print_ISBN :
0-7803-2736-5
Type :
conf
DOI :
10.1109/ECTC.1995.517766
Filename :
517766
Link To Document :
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