DocumentCode
270369
Title
Sputter Deposition of Nanostructured TiO2 Thin Films
Author
HoraÌkovaÌ, Marta ; CernyÌ, Pavel ; KriÌzÌŒ, Pavel ; BartosÌŒ, Petr ; SÌŒpatenka, Petr
Author_Institution
Dept. of Appl. Phys. & Technol., Univ. of South Bohemia, Ceské Budejovice, Czech Republic
Volume
42
Issue
10
fYear
2014
fDate
Oct. 2014
Firstpage
2790
Lastpage
2791
Abstract
A physical vapor deposition (PVD) method using plasma discharge-glancing angle deposition (GLAD), based on a variation of the particle´s incidence angle to the substrate, enables the formation of TiO2 thin films with oriented columnar nanostructure. The incidence angle influences crystalline, nanostructure, and surface properties of the deposited films. Images illustrating the GLAD PVD method and scanning electron microscopy images of the TiO2 thin films deposited with different incidence angles α are presented.
Keywords
nanofabrication; nanoparticles; plasma deposition; scanning electron microscopy; sputter deposition; thin films; titanium compounds; TiO2; crystalline properties; nanostructured TiO2 thin films; oriented columnar nanostructure; particle incidence angle; physical vapor deposition; plasma discharge-glancing angle deposition; scanning electron microscopy; sputter deposition; surface properties; Educational institutions; Scanning electron microscopy; Sputtering; Substrates; Surface morphology; Surface treatment; Magnetrons; plasma applications; scanning electron microscopy; sputtering; sputtering.;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2014.2326896
Filename
6834782
Link To Document