Title :
Modelling fusible CVD glass planarization flow contours
Author_Institution :
SRI Int., Princeton, NJ, USA
Abstract :
A comparison between experimental and simulated fusible chemical vapor deposition (CVD) glass planarization flow contours is presented. The simulated contours assume Newtonian viscous flow and a hydrostatic pressure gradient caused by the surface tension and the radius of curvature of the contour. At long flow lengths, ⩾100 μm, reasonable agreement between experiment and simulation is obtained. Assuming no change in film surface tension, the flow rate constant increase is directly related to a tenfold decrease in film viscosity at the higher flow temperature
Keywords :
CVD coatings; flow simulation; glass; modelling; surface tension; surface treatment; viscosity of liquids; Newtonian viscous flow; chemical vapor deposition; film viscosity; flow contours; fusible CVD glass planarization; hydrostatic pressure gradient; simulated contours; surface tension; Chemical vapor deposition; Fluid flow measurement; Glass; Planarization; Semiconductor device modeling; Size measurement; Surface tension; Surface topography; Temperature; Viscosity;
Conference_Titel :
VLSI Multilevel Interconnection Conference, 1990. Proceedings., Seventh International IEEE
Conference_Location :
Santa Clara, CA
DOI :
10.1109/VMIC.1990.127903
