DocumentCode
2703863
Title
Modelling fusible CVD glass planarization flow contours
Author
White, L.K.
Author_Institution
SRI Int., Princeton, NJ, USA
fYear
1990
fDate
12-13 Jun 1990
Firstpage
377
Lastpage
379
Abstract
A comparison between experimental and simulated fusible chemical vapor deposition (CVD) glass planarization flow contours is presented. The simulated contours assume Newtonian viscous flow and a hydrostatic pressure gradient caused by the surface tension and the radius of curvature of the contour. At long flow lengths, ⩾100 μm, reasonable agreement between experiment and simulation is obtained. Assuming no change in film surface tension, the flow rate constant increase is directly related to a tenfold decrease in film viscosity at the higher flow temperature
Keywords
CVD coatings; flow simulation; glass; modelling; surface tension; surface treatment; viscosity of liquids; Newtonian viscous flow; chemical vapor deposition; film viscosity; flow contours; fusible CVD glass planarization; hydrostatic pressure gradient; simulated contours; surface tension; Chemical vapor deposition; Fluid flow measurement; Glass; Planarization; Semiconductor device modeling; Size measurement; Surface tension; Surface topography; Temperature; Viscosity;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Multilevel Interconnection Conference, 1990. Proceedings., Seventh International IEEE
Conference_Location
Santa Clara, CA
Type
conf
DOI
10.1109/VMIC.1990.127903
Filename
127903
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