DocumentCode :
2704850
Title :
Efficient prediction of interconnect crosstalk using neural networks
Author :
Ilumoka, A.A.
Author_Institution :
Microelectron. Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
fYear :
2000
fDate :
2000
Firstpage :
122
Lastpage :
125
Abstract :
Interconnect crosstalk prediction has become increasingly important with deep submicron downscaling of ICs and wafer scale integration. Existing tools for management of the emi problem are computationally expensive and not very broad in application. The unique approach proposed involves the creation of parameterized models of primitive interconnect structures, wirecells, using modular artificial neural networks (MANNs). The finite element method, a circuit simulator and a neural network multi-paradigm prototyping system are coupled together to produce a library of re-usable MANN-based wirecell models. The method is especially attractive because it is capable of modeling the simultaneous effect of several uncorrelated variables such as interconnect length, width, thickness, separation, conductor and insulating medium characteristics on crosstalk and delay. Equi-coupling contours called isocouples are derived for noise characterization to guide design activities such as placement (e.g. matched devices placed on same isocouple). Experimental results from a transconductance amplifier demonstrate the viability of the approach
Keywords :
circuit CAD; circuit simulation; crosstalk; delays; finite element analysis; integrated circuit interconnections; neural nets; wafer-scale integration; circuit simulator; deep submicron downscaling; delay; equicoupling contours; experimental results; finite element method; interconnect crosstalk prediction; isocouples; modular artificial neural networks; multiparadigm prototyping system; neural networks; transconductance amplifier; wafer scale integration; wirecells; Artificial neural networks; Circuit simulation; Computational modeling; Coupling circuits; Crosstalk; Finite element methods; Integrated circuit interconnections; Semiconductor device modeling; Virtual prototyping; Wafer scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Tools with Artificial Intelligence, 2000. ICTAI 2000. Proceedings. 12th IEEE International Conference on
Conference_Location :
Vancouver, BC
ISSN :
1082-3409
Print_ISBN :
0-7695-0909-6
Type :
conf
DOI :
10.1109/TAI.2000.889856
Filename :
889856
Link To Document :
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