• DocumentCode
    2706149
  • Title

    Application of low temperature plasma modification explore the technical processing of nano HMX

  • Author

    Xiaode Guo ; Binbin Dong ; Fengsheng Li ; Zhixiang Wang ; Fei Wu

  • Author_Institution
    Nat. Special Superfine Powder Eng. Res. Center of China, Nanjing Univ. of Sci. & Technol., Nanjing, China
  • fYear
    2015
  • fDate
    23-25 April 2015
  • Firstpage
    38
  • Lastpage
    41
  • Abstract
    Firstly, use the low temperature plasma equipment to process nano HMX. Then, use The dispersion and the morphology of nano HMX were characterized by Wet Zetasizer Nano and scanning electron microscope (SEM). Use fourier transform infrared spectrometer (FT-IY) and X-ray powder diffraction X-ray diffraction (XRD) and X-ray photoelectron spectrometer (XPS) to analyze its main composition, structure and surface element valence state changes. Finally, differential scanning calorimetry-thermogravimetric analysis (TG-DSC) to analyze the nanometer HMX thermal decomposition characteristics. Use the impact sensitivity test instrument to test its impact sensitivity. The result shows that treated nano HMX reunion reduce dispersion becomes better, treated nano HMX lower impact sensitivity of 8.1%, whitch improved its safety.
  • Keywords
    Fourier transform infrared spectra; X-ray diffraction; X-ray photoelectron spectra; differential scanning calorimetry; explosives; nanostructured materials; plasma materials processing; powder technology; scanning electron microscopy; Fourier transform infrared spectrometer; X-ray photoelectron spectrometer; X-ray powder diffraction; differential scanning calorimetry-thermogravimetric analysis; low-temperature dispersion modification; low-temperature plasma equipment; nanoHMX morphology; nanometer HMX thermal decomposition characteristics; scanning electron microscope; surface element valence state; Dispersion; Nanoparticles; Plasma temperature; Sensitivity; Temperature; Thermal decomposition; dispersion; impact sensitivity; low temperature plasma; nano HMX; the thermal decomposition characteristics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Defence Technology (ACDT), 2015 Asian Conference on
  • Conference_Location
    Hua Hin
  • Print_ISBN
    978-1-4799-8166-3
  • Type

    conf

  • DOI
    10.1109/ACDT.2015.7111580
  • Filename
    7111580