Title :
Characterization of Annealed Ni/Cu Multilayers on Si(100)
Author :
Zolanvari, A. ; Sadeghi, H.
Author_Institution :
Dept. of Phys. Arak, Univ. of Arak, Arak, Iran
Abstract :
This paper reports the grown of Ni/Cu multilayers on Si monocrystalline substrates and shows some polarization investigations of Si(100) substrates. Nano structural characterization of the multilayers by high angle X-ray diffraction (XRD) and high temperature X-ray diffraction (HT-XRD) also have been presented. Annealed Ni/Cu multilayers on Si(100) substrate has been reported. The main purpose of present work is to study the Ni/Cu multilayer when it was annealed. Finally we presented the influence of bilayer and sublayer (Ni and Cu) thicknesses on the magnetic properties of multilayers.
Keywords :
X-ray diffraction; annealing; elemental semiconductors; multilayers; nanostructured materials; silicon; substrates; HT-XRD; Ni/Cu multilayers; Si; Si monocrystalline substrates; Si(100) substrates; annealing; high temperature X-ray diffraction; magnetic properties; nanostructural characterization; polarization investigations; Annealing; Copper; Magnetic multilayers; Magnetic properties; Nickel; Nonhomogeneous media; Substrates; Surface morphology; Surface topography; X-ray diffraction; high temperature X-ray diffraction; multilayers; nanostructured materials;
Conference_Titel :
MEMS, NANO, and Smart Systems (ICMENS), 2009 Fifth International Conference on
Conference_Location :
Dubai
Print_ISBN :
978-0-7695-3938-6
Electronic_ISBN :
978-1-4244-5616-1
DOI :
10.1109/ICMENS.2009.59
