DocumentCode :
2708515
Title :
Excimer laser irradiated phase masks for grating formation
Author :
Dyer, P.E. ; Farley, R.J. ; Giedl, R.
Author_Institution :
Dept. of Appl. Phys., Hull Univ., UK
fYear :
1995
fDate :
34729
Firstpage :
42401
Lastpage :
42404
Abstract :
Excimer laser irradiated phase masks provide a convenient and effective method for writing submicron gratings for optoelectronic device applications including optical fibre gratings. We have analysed the interference field produced by a periodic mask and have assessed the near-field energy density and fluence distribution for varying degrees of order content when exposed using an excimer laser with finite spatial and temporal coherence. Comparisons are made between theory and experimental findings for gratings produced on ablated polymers and in optical fibres
Keywords :
diffraction gratings; excimer lasers; laser materials processing; optical fabrication; optical fibre fabrication; optical polymers; ablated polymers; excimer laser; fluence distribution; grating formation; interference field; near-field energy density; optical fibre gratings; optical fibres; optoelectronic device applications; phase masks; spatial coherence; submicron gratings; temporal coherence;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Optical Fibre Gratings and Their Applications, IEE Colloquium on
Conference_Location :
London
Type :
conf
DOI :
10.1049/ic:19950081
Filename :
478108
Link To Document :
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