DocumentCode :
2708544
Title :
Very Compact High-gain Broadband Low-noise Amplifier in InP HEMT Technology
Author :
Masuda, Satoshi ; Ohki, Toshihiro ; Hirose, Tatsuya
Author_Institution :
Fujitsu Labs. Ltd., Atsugi
fYear :
2006
fDate :
11-16 June 2006
Firstpage :
77
Lastpage :
80
Abstract :
We successfully developed an InP high electron mobility transistor (HEMT) low-noise amplifier (LNA) using multi-layer transmission lines. The fabricated five-stage LNA achieved a 43 dB gain with a noise figure (NF) of 1.9 dB at 23 GHz and a gain of more than 40 dB from 18 to 43 GHz. The maximum gain was 49.5 dB at 32 GHz and the chip size was only 1.8 times 0.9 mm2, resulting in a gain density of 30.5 dB/mm2. To the best of our knowledge, this gain density is the highest performance in any Ka-band LNA reported to date. In addition, the design accuracy of the LNA was also demonstrated
Keywords :
HEMT integrated circuits; III-V semiconductors; MMIC amplifiers; indium compounds; low noise amplifiers; transmission lines; wideband amplifiers; 1.9 dB; 18 to 43 GHz; 43 dB; 49.5 dB; InP; Ka-band amplifier; broadband low-noise amplifier; compact high-gain amplifier; gain density; high electron mobility transistor; multilayer transmission lines; Digital circuits; Frequency; Gain; HEMTs; Indium phosphide; Low-noise amplifiers; MMICs; Microstrip; Nonhomogeneous media; Semiconductor materials; InP HEMT; gain density; low-noise amplifier; multi-layer;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest, 2006. IEEE MTT-S International
Conference_Location :
San Francisco, CA
ISSN :
0149-645X
Print_ISBN :
0-7803-9541-7
Electronic_ISBN :
0149-645X
Type :
conf
DOI :
10.1109/MWSYM.2006.249932
Filename :
4014823
Link To Document :
بازگشت