DocumentCode
2709112
Title
Physically aware DFT: Is it worth all the heavy lifting?
Author
Winemberg, LeRoy
Author_Institution
Freescale Semicond., Austin, TX, USA
fYear
2009
fDate
1-6 Nov. 2009
Firstpage
1
Lastpage
2
Abstract
DFT tools that look at physical effects are already available from EDA tool providers. For example there are small delay defect (SDD) tools that try to take into account interconnect defects such as partial opens as well as process variations by looking at a node´s slack. And there are bridging fault tools that look for shorts between conductive structures. However, both of these tools are known to have extremely long CPU run times and produce very large pattern sets. Also, silicon providers seem to be caught in a catch-22 with the tool vendors over these issues. EDA companies want silicon test data and physical failure analysis showing that their tools are effective before they invest any effort in improving the run time and pattern size issues of existing tools but often the silicon providers can´t use these tools to collect this data until the tools have first been improved. If this wasn´t enough of a problem, some silicon providers have found that the patterns produced by these commercial physically aware tools are no more effective at catching defects than regular stuck-at and transition delay fault patterns. Are we heading in the right direction by developing these physically aware tools and are the issues described above just growing pains? Or should we just ditch the effort - stuck-at and standard transition fault are good enough?
Keywords
design for testability; microprocessor chips; CPU; DFT; bridging fault tools; design for testability; physical failure analysis; small delay defect tools; Bridges; Delay effects; Electronic design automation and methodology; Failure analysis; Investments; Pain; Power supplies; Power systems; Silicon; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Test Conference, 2009. ITC 2009. International
Conference_Location
Austin, TX
Print_ISBN
978-1-4244-4868-5
Electronic_ISBN
978-1-4244-4867-8
Type
conf
DOI
10.1109/TEST.2009.5355910
Filename
5355910
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