Title :
Thermal behavior of self-heating effect in FinFET devices acting on back-end interconnects
Author :
Chang, C.W. ; Liu, S.E. ; Lin, B.L. ; Chiu, C.C. ; Lee, Y.-H. ; Wu, K.
Author_Institution :
TQRD, Taiwan Semicond. Manuf. Co., Ltd., Hsinchu, Taiwan
Abstract :
Thermal impact on back-end interconnects resulted from self-heating (SH) effect in FinFET devices is investigated here. The self-heating effect in FinFET devices will generate more heat in fin structures than planar devices and influence the reliability of interconnects. In this study, testing structures including metal sensors of different metal layers are designed, fabricated and measured, as well as a computer-aided finite element model is also built and utilized in this report. With FinFET devices, the evaluation includes temperature saturation with the number of powered devices, temperature rising in different metal layer, and self-heating effect accompanying with joule heating (so-called coupling effect). This investigation shows the contribution of SH effect would change with varying joule heating. It is important to considering the temperature rising from SH effect when assess the risk of back-end interconnects reliability.
Keywords :
MOSFET; finite element analysis; interconnections; semiconductor device models; semiconductor device reliability; FinFET devices; Joule heating; SH effect; back-end interconnect reliability; computer-aided finite element model; coupling effect; fin structures; metal sensors; planar devices; powered devices; self-heating effect; temperature saturation; thermal behavior; FinFETs; Heating; Metals; Reliability; Temperature; Temperature measurement; Temperature sensors; coupling effect; fin-fet devices; joule heating effect; self-heating effect;
Conference_Titel :
Reliability Physics Symposium (IRPS), 2015 IEEE International
Conference_Location :
Monterey, CA
DOI :
10.1109/IRPS.2015.7112696